ZHANGLi-cheng,FENGKai,LIUChe,et al.UV/O3 Process for Treating Wastewater Containing TMAH from Electronics Industry[J].China Water & Wastewater,2024,40(9):63-68.
UV/O3 Process for Treating Wastewater Containing TMAH from Electronics Industry
China Water & Wastewater[ISSN:1000-4062/CN:12-1073/TU]
volume:
第40卷
Number:
第9期
Page:
63-68
Column:
Date of publication:
2024-05-01
- Keywords:
- advanced oxidation; ultraviolet/ozone; tetramethylammonium hydroxide; response surface method
- Abstract:
- This paper analyzed the feasibility of ultraviolet/ozone (UV/O3) advanced oxidation process for treating wastewater containing tetramethylammonium hydroxide (TMAH), and investigated the effects of reaction time, initial O3 concentration and pH on the treatment performance of the UV/O3 process based on Box?Behnken response surface method, so as to solve the problem that TMAH wastewater is difficult to biodegrade. When initial concentration of TMAH was 250 mg/L, initial concentration of O3 was 8.1 mg/L, pH was 12.5 and reaction time was 60 min, the UV/O3 process effectively degraded TMAH in the wastewater. After optimising the test conditions, the maximum inorganic rate of N element in the TMAH wastewater reached 53.5%, indicating that 53.5% of TMAH was degraded to ammonia nitrogen and nitrate nitrogen, which was close to 54.8% predicted by the model. The analysis of the response surface indicated that the significance of influencing factors in descending order was reaction time, initial O3 concentration and pH.
Last Update:
2024-05-01