ZHANGLicheng,FENGKai,LIUChe,et al.Treatment of TMAH Wastewater from Electronics Industry by UV/PS/O3 Process[J].China Water & Wastewater,2026,42(7):72-77.
Treatment of TMAH Wastewater from Electronics Industry by UV/PS/O3 Process
China Water & Wastewater[ISSN:1000-4062/CN:12-1073/TU]
volume:
第42卷
Number:
第7期
Page:
72-77
Column:
Date of publication:
2026-04-01
- Keywords:
- advanced oxidation; ultraviolet/persulfate/ozone; tetramethylammonium hydroxide; response surface method
- Abstract:
- Due to its strong alkalinity and high toxicity, tetramethylammonium hydroxide (TMAH) wastewater cannot be effectively treated by conventional biological processes. The ultraviolet/persulfate/ozone (UV/PS/O3) process generates hydroxyl radicals (·OH) and sulfate radicals (·SO4-). Therefore, the synergistic effect of these two radicals on TMAH wastewater treatment was investigated. Based on the Box-Behnken response surface methodology, the effect of persulfate (PS) dosage, initial O3 concentration, and pH on the UV/PS/O3 process treatment of TMAH wastewater were evaluated. The results showed that under the conditions of an initial TMAH concentration of 250 mg/L, UV lamp power of 28 W, PS dosage of 10.8 g/L, initial O3 concentration of 8.1 mg/L, pH of 3.0, and a reaction time of 60 minutes, more than 90% of TMAH was degraded. A regression model was established, revealing that the significance of the influencing factors followed the order: PS dosage > initial O3 concentration > pH.
Last Update:
2026-04-01