SUN Duo,WU Gang,ZHUXianzheng,et al.Performance Comparison of TFC and TFN Reverse Osmosis Membranes in Treating Semiconductor Wastewater[J].China Water & Wastewater,2026,42(1):22-27.
TFC和TFN反渗透膜处理半导体废水的性能对比
- Title:
- Performance Comparison of TFC and TFN Reverse Osmosis Membranes in Treating Semiconductor Wastewater
- Keywords:
- reverse osmosis; semiconductor wastewater; reclamation and reuse; thin-film composite (TFC) membrane; thin-film nanocomposite (TFN) membrane
- 摘要:
- 半导体废水因污染物成分复杂且可生化性差，其高效再生回用是半导体行业实现水资源循环利用与“双碳”目标的关键挑战。以华东某半导体再生水厂为研究对象，通过工程化试验对比聚酰胺复合薄膜（TFC）与聚酰胺纳米复合薄膜（TFN）的反渗透（RO）性能差异，系统评估两者在脱盐率、产水量、化学清洗周期及长期稳定性等方面的表现。结果表明，TFN膜在低温及高盐度进水条件下，脱盐率保持在95%以上，通量稳定性优于TFC膜（波动范围为20%~40%），且平均化学清洗周期延长80%以上（从3.35 d提升至6.40 d），具有更好的综合技术经济性。
- Abstract:
- Semiconductor wastewater, characterized by complex pollutants composition and poor biodegradability, poses a critical challenge for efficient reuse in achieving water resource circularity and dual-carbon goals (carbon peaking and carbon neutrality) within the semiconductor industry. This study conducted engineering-scale experiments at a semiconductor wastewater reclamation plant in East China to systematically compare the performance of thin-film composite (TFC) membranes and thin-film nanocomposite (TFN) reverse osmosis (RO) membranes. Key parameters evaluated included desalination efficiency, water production capacity, chemical cleaning frequency, and long-term operational stability. Results demonstrated that the TFN membranes exhibited superior performance under low-temperature and high-salinity conditions, maintaining a stable desalination rate (exceeding 95%) and flux stability, significantly outperforming TFC membranes (fluctuation range: 20%-40%). Moreover, the TFN membranes extended the average chemical cleaning interval by over 80%（from 3.35 days to 6.40 days）, significantly enhancing the overall techno-economic efficiency.
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