[1]许玲,杜尔登,冯欣欣,等.UV/H2O2/O3工艺降解典型有机防晒剂[J].中国给水排水,2023,39(3):80-87.
　XULing,DUEr-deng,FENGXin-xin,et al.Degradation of Typical Organic Sunscreen by UV/H2O2/O3 Process[J].China Water & Wastewater,2023,39(3):80-87.
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UV/H2O2/O3工艺降解典型有机防晒剂

中国给水排水[ISSN:1000-4062/CN:12-1073/TU] 卷: 第39卷 期数: 2023年第3期 页码: 80-87 栏目: 出版日期: 2023-02-01
Title:
Degradation of Typical Organic Sunscreen by UV/H2O2/O3 Process
作者:
许玲1， 杜尔登2， 冯欣欣2， 吕贞3， 许光明3， 彭明国2， 郑璐2
（1.苏州科技大学 环境科学与工程学院，江苏 苏州 215009；2.常州大学 环境与安全工程学院，江苏 常州 213164；3.常州市排水管理处，江苏 常州 213002）
Author(s):
XU　Ling1， DU　Er-deng2， FENG　Xin-xin2， Lü　Zhen3， XU　Guang-ming3， PENG　Ming-guo2， ZHENG　Lu2
（1. School of Environmental Science and Engineering， Suzhou University of Science and Technology， Suzhou 215009， China； 2. School of Environmental and Safety Engineering， Changzhou University， Changzhou 213164， China； 3. Changzhou Drainage Administration， Changzhou 213002， China）
关键词:
紫外/双氧水/臭氧联用工艺（UV/H2O2/O3）;  有机防晒剂;  2; 4-二羟基二苯甲酮;  响应面模型;  降解机理
Keywords:
UV/H2O2/O3 process;  organic sunscreen;  2; 4-dihydroxybenzophenone (UV-0);  response surface model;  degradation mechanism
摘要:
有机防晒剂作为一种新兴污染物引发的环境安全风险备受关注。采用紫外/双氧水/臭氧联用工艺（UV/H2O2/O3）降解典型有机防晒剂2，4-二羟基二苯甲酮（UV-0），基于中心组合设计方法进行实验，考察影响因素，并探索降解机理。结果表明，在H2O2浓度为340 μmol/L、UV-0初始浓度为5 mg/L、UV光强为170 μW/cm2、O3流量为0.38 L/min条件下，20 min内对UV-0的降解率高达99.9%，反应速率常数为0.570 7 min-1，降解效果良好。响应面模型能较好地模拟和预测实验结果，并探索反应空间，H2O2浓度、UV光强、O3流量等因素会影响降解效果。高分辨率质谱和量子化学结构分析表明，UV-0降解过程中羟基加成反应首先发生在C10位置，形成羟基和二羟基加成产物，随后通过碳碳键断裂和芳香环裂解生成草酸等小分子酸。UV/H2O2/O3工艺适用于现有污水处理厂的升级改造，在污水深度处理方面具有潜在应用价值。
Abstract:
Organic sunscreen is an emerging pollutant and has attracted much attention because of its environmental safety risk. UV/hydrogen peroxide/ozone process (UV/H2O2/O3 ) was used to degrade the typical organic sunscreen 2,4-dihydroxybenzophenone (UV-0). The experiments were conducted based on the central combination design method to investigate the influencing factors and explore the degradation mechanism. When the experimental conditions were as follows: H2O2 concentration of 340 μmol/L, UV-0 initial concentration of 5 mg/L, UV intensity of 170 μW/cm2 and O3 flow rate of 0.38 L/min, the degradation rate of UV-0 reached 99.9%, and the reaction rate constant was 0.570 7 min-1 within 20 min, indicating that good degradation performance was obtained. The response surface model simulated and predicted the experimental results well, which could further explore the reaction space. The factors such as H2O2 concentration, UV intensity and O3 flow rate affected the degradation efficiency. According to the high-resolution mass spectrometry and quantum chemical structure analysis, the hydroxyl addition reaction first occurred at the C10 position to form hydroxyl and dihydroxyl addition products, and then form oxalic acid and other small molecular acids through carbon-carbon bond breaking and aromatic cracking in the process of UV-0 degradation. UV/H2O2/O3 process is easy to be applied to the upgrading of existing wastewater treatment plants, and has potential application in advanced wastewater treatment.
更新日期/Last Update: 2023-02-01