[1]雷成,黄文凤,章慧,等.砷化镓芯片行业含砷废水深度处理中试研究[J].中国给水排水,2023,39(5):101-105.
　LEICheng,HUANGWen-feng,ZHANGhui,et al.A Pilot Study on Advanced Treatment of Arsenic-containing Wastewater in Gallium Arsenide Chip Industry[J].China Water & Wastewater,2023,39(5):101-105.
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砷化镓芯片行业含砷废水深度处理中试研究

中国给水排水[ISSN:1000-4062/CN:12-1073/TU] 卷: 第39卷 期数: 2023年第5期 页码: 101-105 栏目: 出版日期: 2023-03-01
Title:
A Pilot Study on Advanced Treatment of Arsenic-containing Wastewater in Gallium Arsenide Chip Industry
作者:
雷成， 黄文凤， 章慧， 张亚明， 唐彤， 舒俊， 黄莉
（四川恒泰环境技术有限责任公司，四川 绵阳 621000）
Author(s):
LEI　Cheng， HUANG　Wen-feng， ZHANG　hui， ZHANG　Ya-ming， TANG　Tong， SHU　Jun， HUANG　Li
（Sichuan Entech Environment Technology Co. Ltd.， Mianyang 621000， China）
关键词:
砷化镓芯片;  含砷废水;  深度处理;  电化学;  三维电极;  一体化装置
Keywords:
gallium arsenide chip;  arsenic-containing wastewater;  advanced treatment;  electrochemistry;  three-dimensional electrode;  integrated device
摘要:
某砷化镓芯片生产厂家的含砷废水经石灰-铁盐法处理后，出水中砷浓度仍有0.2 mg/L，未达到回用水的要求。采用含有活性炭三维电极的一体化除砷装置对该含砷废水进行中试规模的深度处理，结果表明，装置在药剂投加量为0.10 g/L、反应时间为60 min、pH为9的最佳条件下运行30 d后，对废水中砷的去除率基本稳定在98%以上，且出水中砷浓度低于0.005 mg/L，达到了《生活饮用水卫生标准》（GB 5749—2006），可满足回用要求。
Abstract:
The arsenic concentration in the wastewater from a gallium arsenide chip manufacturer was still 0.2 mg/L after the treatment of lime-ferric salt process, which did not meet the requirement of reuse water. A pilot-scale integrated arsenic removal device containing activated carbon three-dimensional electrode was used for the advanced treatment of arsenic-containing wastewater. The optimal operational parameters were as follows: chemicals dosage of 0.10 g/L, reaction time of 60 min and pH of 9. After 30 days of operation with these parameters, the removal rate of arsenic in the wastewater basically stabilized above 98%, and the arsenic concentration in the effluent was less than 0.005 mg/L, which met the limit specified in Standards for Drinking Water Quality (GB 5749-2006) and could be reused to production.
更新日期/Last Update: 2023-03-01