ZHANGLi-cheng,FENGKai,LIUChe,et al.UV/O3 Process for Treating Wastewater Containing TMAH from Electronics Industry[J].China Water & Wastewater,2024,40(9):63-68.
UV/O3工艺处理电子工业TMAH废水
- Title:
- UV/O3 Process for Treating Wastewater Containing TMAH from Electronics Industry
- Keywords:
- advanced oxidation; ultraviolet/ozone; tetramethylammonium hydroxide; response surface method
- 摘要:
- 为了解决电子工业四甲基氢氧化铵（TMAH）废水难以生物降解的问题，分析了紫外/臭氧（UV/O3）高级氧化工艺处理TMAH废水的可行性，并基于Box-Behnken响应曲面法评价了反应时间、O3初始浓度、pH等因素对UV/O3工艺处理TMAH废水的影响。结果表明，在TMAH初始浓度为250 mg/L、O3初始浓度为8.1 mg/L、pH为12.5、反应时间为60 min的条件下，UV/O3工艺能够有效降解TMAH废水。优化试验条件后，TMAH废水中N元素的无机化率最大达到了53.5%，表明有53.5%的TMAH被降解为氨氮和硝态氮，与模型给出的54.8%比较接近。通过对响应曲面的分析，得出影响因素显著性的大小关系为反应时间>O3初始浓度>pH。
- Abstract:
- This paper analyzed the feasibility of ultraviolet/ozone (UV/O3) advanced oxidation process for treating wastewater containing tetramethylammonium hydroxide (TMAH), and investigated the effects of reaction time, initial O3 concentration and pH on the treatment performance of the UV/O3 process based on Box?Behnken response surface method, so as to solve the problem that TMAH wastewater is difficult to biodegrade. When initial concentration of TMAH was 250 mg/L, initial concentration of O3 was 8.1 mg/L, pH was 12.5 and reaction time was 60 min, the UV/O3 process effectively degraded TMAH in the wastewater. After optimising the test conditions, the maximum inorganic rate of N element in the TMAH wastewater reached 53.5%, indicating that 53.5% of TMAH was degraded to ammonia nitrogen and nitrate nitrogen, which was close to 54.8% predicted by the model. The analysis of the response surface indicated that the significance of influencing factors in descending order was reaction time, initial O3 concentration and pH.
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