[1]张立成,冯锴,刘澈,等.UV/PS/O3工艺处理电子工业TMAH废水[J].中国给水排水,2026,42(7):72-77.
　ZHANGLicheng,FENGKai,LIUChe,et al.Treatment of TMAH Wastewater from Electronics Industry by UV/PS/O3 Process[J].China Water & Wastewater,2026,42(7):72-77.
点击复制

UV/PS/O3工艺处理电子工业TMAH废水

中国给水排水[ISSN:1000-4062/CN:12-1073/TU] 卷: 第42卷 期数: 2026年第7期 页码: 72-77 栏目: 出版日期: 2026-04-01
Title:
Treatment of TMAH Wastewater from Electronics Industry by UV/PS/O3 Process
作者:
张立成1， 冯锴1， 刘澈1,2， 张志磊1， 张宇婷1
（1.沈阳建筑大学 市政与环境工程学院，辽宁 沈阳 110168；2.世源科技工程有限公司，北京 100142）
Author(s):
ZHANG　Licheng1， FENG　Kai1， LIU　Che1，2， ZHANG　Zhilei1， ZHANG　Yuting1
（1. School of Municipal and Environmental Engineering， Shenyang Jianzhu University， Shenyang 110168， China； 2. SY Technology， Engineering and Construction Co. Ltd.， Beijing 100142，China）
关键词:
高级氧化;  紫外/过硫酸盐/臭氧;  四甲基氢氧化铵;  响应曲面
Keywords:
advanced oxidation;  ultraviolet/persulfate/ozone;  tetramethylammonium hydroxide;  response surface method
摘要:
四甲基氢氧化铵（TMAH）废水具有强碱性和高毒性，当前生物处理工艺无法降解该物质。由于紫外/过硫酸盐/臭氧工艺（UV/PS/O3）能产生羟基自由基（·OH）和硫酸根自由基（·SO4-），因此研究这两种自由基协同处理TMAH废水的效果，并基于Box-Behnken响应曲面法评价了PS投加量、O3初始浓度、pH对UV/PS/O3工艺处理TMAH废水的影响。结果表明，在TMAH初始浓度为250 mg/L、UV灯功率为28 W、PS投加量为10.8 g/L、O3初始浓度为8.1 mg/L、pH为3.0、反应时间为60 min的条件下，超过90%的TMAH被降解；建立回归模型发现，影响因素显著性的大小关系为PS投加量>O3初始浓度>pH。
Abstract:
Due to its strong alkalinity and high toxicity, tetramethylammonium hydroxide (TMAH) wastewater cannot be effectively treated by conventional biological processes. The ultraviolet/persulfate/ozone (UV/PS/O3) process generates hydroxyl radicals (·OH) and sulfate radicals (·SO4-). Therefore, the synergistic effect of these two radicals on TMAH wastewater treatment was investigated. Based on the Box-Behnken response surface methodology, the effect of persulfate (PS) dosage, initial O3 concentration, and pH on the UV/PS/O3 process treatment of TMAH wastewater were evaluated. The results showed that under the conditions of an initial TMAH concentration of 250 mg/L, UV lamp power of 28 W, PS dosage of 10.8 g/L, initial O3 concentration of 8.1 mg/L, pH of 3.0, and a reaction time of 60 minutes, more than 90% of TMAH was degraded. A regression model was established, revealing that the significance of the influencing factors followed the order: PS dosage > initial O3 concentration > pH.

相似文献/References:

[1]雷晨,许路,张琼华,等.紫外活化过硫酸盐技术用于污水厂二级出水深度处理[J].中国给水排水,2020,36(15):86.
　LEI Chen,XU Lu,ZHANG Qiong-hua,et al.Advanced Treatment of Secondary Effluent from a Wastewater Treatment Plant by Ultraviolet Activated Persulfate[J].China Water & Wastewater,2020,36(7):86.
[2]刘建林,谢杰.膜芬顿技术在污水深度处理中的应用[J].中国给水排水,2020,36(22):145.
　LIU Jian-lin,XIE Jie.Application of Membrane Fenton Coupling Technology in Wastewater Advanced Treatment[J].China Water & Wastewater,2020,36(7):145.
[3]孙庆花,张晓霞,赵益华,等.天津某高盐高排放标准污水厂提标改造工程设计[J].中国给水排水,2021,37(8):83.
　SUN Qing-hua,ZHANG Xiao-xia,ZHAO Yi-hua,et al.Design of a Wastewater Treatment Plant Upgrading Project with High Salinity Influent and High Discharge Standard in Tianjin[J].China Water & Wastewater,2021,37(7):83.
[4]李磊,王波,张苗,等.O3/H2O2高级氧化技术抑制溴酸盐生成中试[J].中国给水排水,2021,37(13):60.
　LI Lei,WANG Bo,ZHANG Miao,et al.Pilot Test on Bromate Formation Inhibition by O3/H2O2 Advanced Oxidation Technology[J].China Water & Wastewater,2021,37(7):60.
[5]张立成,冯锴,刘澈,等.UV/O3工艺处理电子工业TMAH废水[J].中国给水排水,2024,40(9):63.
　ZHANGLi-cheng,FENGKai,LIUChe,et al.UV/O3 Process for Treating Wastewater Containing TMAH from Electronics Industry[J].China Water & Wastewater,2024,40(7):63.

更新日期/Last Update: 2026-04-01